Control of substrate surface temperature in millisecond annealing technique using thermal plasma jet

Thin Solid Films

Volumn 515, Issue 12, 2007, Pages 4897-4900

  Okada, T ^a   Higashi, S ^a   Kaku, H ^a   Koba, N ^a   Murakami, H ^a   Miyazaki, S ^a  

^a HIROSHIMA UNIVERSITY   (Japan)

Author keywords

Rapid thermal annealing; Temperature measurement; Thermal plasma jet

Indexed keywords

LIGHT REFLECTION; RAPID THERMAL ANNEALING; SUBSTRATES; TEMPERATURE CONTROL; TEMPERATURE MEASUREMENT; TRANSIENT ANALYSIS;

MILLISECOND ANNEALING; OPTICAL REFLECTIVITY; SURFACE TEMPERATURE; THERMAL PLASMA JETS;

PLASMA JETS;

EID: 33947119588     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.10.049     Document Type: Article

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