Surface analysis of the nanostructured W-Ti thin film deposited on silicon

Applied Surface Science

Volumn 253, Issue 12, 2007, Pages 5196-5202

  Petrovic S ^a   Bundaleski, N ^a   Perusko D ^a   Radovic M ^a   Kovac J ^b   Mitric M ^a   Gakovic B ^a   Rakocevic Z ^a  

^a UNIVERSITY OF BELGRADE   (Serbia)

^b JO EF STEFAN INSTITUTE   (Slovenia)

Author keywords

GIXRD; LEIS; STM; Surface segregation; W Ti thin films; XPS

Indexed keywords

ARGON; NANOSTRUCTURED MATERIALS; SCANNING TUNNELING MICROSCOPY; SILICON; SURFACE SEGREGATION; SURFACE STRUCTURE; X RAY DIFFRACTION;

LOW ENERGY ION SCATTERING (LEIS); METALLIC OXIDES; W-TI THIN FILMS;

THIN FILMS;

EID: 33847756724     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.10.077     Document Type: Article

References (21)

1. Oparowski J.M., Sisson R.D., and Biederman R.R. Thin Solid Films 153 (1987) 313
2. Milosavljević M., Bibić N., Wilson I.H., and Peruško D. Thin Solid Films 164 (1988) 493
3. Nowicki R.S., Harris J.M., Nicolet M.A., and Mitchell I.V. Thin Solid Films 53 (1978) 195
4. Milosavljević M., Bibić N., Wilson I.H., Turković J., Stojanović M., and Peruško D. Advances in Low-temperature Plasma Chemistry, Technology, Applications vol. 3 (1991), Technomic Publishing AG p. 245
5. Milosavljević M., Bibić N., Stojanović M., Turković J., and Wilson I.H. Vacuum 41 (1990) 831
6. Terzić I., Bundaleski N., Rakočević Z., Oklobdžija N., and Elazar J. Rev. Sci. Inst. 7 (2000) 4195
7. Louro C., and Cavalerro A. J. Electrochem. Soc. 144 (1997) 259
8. Glebovsky V.G., Yaschak V.Yu., Baranov V.V., and Sackovich E.L. Thin solid films 257 (1995) 1
9. Petrović S., Adnadjević B., Peruško D., Popović N., Bundaleski N., Radović M., Gaković B., and Rakočević Z. J. Serb. Chem. Soc. 71 (2006) 969
10. Briggs D., and Seah M.P. Practical Surface Analyses, Auger and X-ray Photoelectron Spectroscopy vol. 1 (1994), John Wiley and Sons, Chichester
11. Fuentes G.G., Elizalde E., Yubero F., and Sanz J.M. Surf. Interf. Anal. 33 (2002) 230
12. Thomas T.M., Neumann H., Czanderna A.W., and Pitts J.R. Surf. Sci. 175 (1986) L737
13. Grundner M., Heiland W., and Tagaluer E. Appl. Phys. 4 (1974) 243
14. Ziegler J.F., Biersack J.P., and Littmark U. The Stopping and Range of Ions in Solids (1985), Pergamon Press
15. Mikhailov S.N., Elfrink R.J.M., Jacobs J.P., van den Oetelaar L.C.A., Scanlon P.J., and Brongersma H.H. Nucl. Instrum. Meth. B 93 (1994) 149
16. Niehus H., Heiland W., and Taglauer E. Surf. Sci. Rep. 17 (1993) 213
17. Popović N., Bogdanov Z., Goncić B., Zec S., and Rakočević Z. Thin solid Films 343-344 (1999) 75
18. Kacsich T., Neubauer M., Geyer U., Baumann K., Rose F., and Uhrmacher M. J. Phys. D: Appl. Phys. 28 (1995) 424
19. Nelli P., Depero L.E., Ferroni M., Groppelli S., Guidi V., Ronconi F., Sangaletti L., and Sberveglieri G. Sens. Actuators B 31 (1996) 89
20. Vitos L., Ruban A.V., Skriver H.L., and Kollar J. Surf. Sci. 411 (1998) 186
21. Chemical encyclopedia, in: L. Knunyanc (Ed.), Sovietskaya Enciklopediya, Moskva, 1988 (in Russian).