Thermal oxidation of tungsten-based sputtered coatings

Journal of the Electrochemical Society

Volumn 144, Issue 1, 1997, Pages 259-266

  Louro, C ^a   Cavaleiro, A ^a  

^a UNIVERSITY OF COIMBRA   (Portugal)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; COMPOSITION EFFECTS; FILMS; MAGNETRON SPUTTERING; NICKEL; NITROGEN; OXIDATION RESISTANCE; POROUS MATERIALS; PROTECTIVE COATINGS; SPUTTER DEPOSITION; TITANIUM; TUNGSTEN;

PARABOLIC LAW; REACTIVE MAGNETRON SPUTTERING; TUNGSTEN COATINGS;

THERMOOXIDATION;

EID: 0030784112     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1837394     Document Type: Article

References (25)

1. P. Kofstad, in High Temperature Corrosion, Barking Elsevier, New York (1988).
2. J. Nowotny, in Diffusion in Solids and High Temperature Oxidation of Metals, Trans Tech Publications Lda, USA (1992).
3. R. K. Singh Raman and J. B. Granammoorthy, Surf. Eng., 10, 141 (1994).
4. M. G. Fontana and N. D. Greene, in Corrosion Engineering, McGraw-Hill, New York (1978).
5. C. Louro and A. Cavaleiro, Surf. Coat. Technol., 74-75, 998 (1995).
6. E. Sundgren and H. T. G. Hentzell, J. Vac. Sci. Technol. A, 4, 2259 (1986).
7. International Center for Diffraction Data, Swarthmore, PA, Cards 5-388. 20-1323, 20-1324, 32-1394, 32-1395, 33-1387, 41-0369, 41-905, and 43-1035.
8. P. Kofstad, in High-Temperature Oxidation of Metals, pp. 250-261, John Wiley & Sons, Inc., New York (1966).
9. E. A. Gulbrasen and K. F. Andrew, This Journal, 107, 619 (1960).
10. J. P. Baur, D. W. Bridges, and W. M. Fassell, ibid., 103, 266 (1956).
11. S. W. Yih and C. T. Wang, in Tungsten, Plenum Press, New York (1970).
12. E. A. Kellett and S. E. Rogers, This Journal, 110, 502 (1963).
13. F. A. Lopez, C. R. A. Catlow, and P. D. Townsend, in Point Defects in Materials, pp. 150-156, Academic Press, Inc., New York (1988).
14. Y. Kobayashi, S. Terada, and K. Kubota, Thin Solid Films, 168, 133 (1989).
15. J. M. West, in Basic Corrosion and Oxidation, Ellis Horwood Publishers, New York (1980).
16. W. W. Webb, J. T. Norton, and C. Wagner, This Journal, 103, 107 (1956).
17. I. J. Raaijmakers, T. Setalvad, A. S. Bhansali, B. J. Burrow, L. Gutai, and K-B. Kim, J. Electron. Mater., 19, 12 (1990).
18. W. Jort, in Diffusion in Solids, Liquids, Gases, pp. 136-150, Academic Press, New York (1960).
19. A. M. Hünz, Mater. Sci. Forum, 43, 131 (1989).
20. O. Kubaschewski and C. B. Alcock, in Metallurgical Thermo-Chemistry, 5th ed., Vol. 24, pp. 267-325, Pergamon Press, Ltd., Elmsford, NY (1979).
21. A. G. Evans, R. M. Cannor, Mater. Sci. Forum, 43, 243 (1989).
22. D. C. Loison, J. C. Pivin, and C. Roques-Carmes, Nucl. Instrum. Methods, 209/210, 975 (1983).
23. M. Pons, M. Caillet, and A. Galerir, ibid., 209/210, 1011 (1983).
24. D. W. Richerson, in Modern Ceramic Engineering, p. 150, Marcel Dekker, Inc., New York (1992).
25. B. Trindade, M. T. Vieira, and E. Bauer-Grosse, Thin Solid Films, 252, 82 (1994).