Design for manufacturability: Challenges and opportunities

ASICON 2005: 2005 6th International Conference on ASIC, Proceedings

Volumn 1, Issue , 2005, Pages 32-34

  Sylvester, Dennis ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DESIGN FOR MANUFACTURABILITY (DFM); SEMICONDUCTOR INDUSTRY;

COST EFFECTIVENESS; INDUSTRIAL MANAGEMENT; INDUSTRIAL RESEARCH; SEMICONDUCTOR MATERIALS;

DESIGN FOR TESTABILITY;

EID: 33847411605     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)

1. S. Nassif, "Design for variability in DSM technologies," Proc. ISQED, pp. 451-454, 2000.
2. P. Gupta and H. Fook-Luen, "Toward a systematic-variation aware timing methodology," Proc. DAC, 2004, pp. 321-326.
3. P. Gupta, A.B. Kahng Y. Kim, and D. Sylvester, "Self-compensating design for focus variation," Proc. DAC, pp. 365-368, 2005.
4. P. Gupta, A.B. Kahng, D. Sylvester, and J. Yang, "Performance-driven OPC for mask cost reduction," Proc. ISQED, pp. 270-275, 2005.
5. J. Yang, L. Capodieci, and D. Sylvester, "Advanced timing analysis based on post-OPC extraction of critical dimensions," Proc. DAC, pp. 359-364, 2005.