SCOPUS 정보 검색 플랫폼

Proceedings - International Symposium on Quality Electronic Design, ISQED

Volumn , Issue , 2005, Pages 270-275

Performance-driven OPC for mask cost reduction

(4) Gupta, Puneet a Kahng, Andrew B a Sylvester, Dennis b Yangt, Jie b

a UNIVERSITY OF CALIFORNIA (United States)

b The Department of Civil and Environmental Engineering (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DESIGN INFORMATION; EDGE PLACEMENT ERRORS; OPTICAL PROXIMITY CORRECTIONS; PERFORMANCE-DRIVEN; POLYSILICON GATES; RESOLUTION ENHANCEMENT TECHNIQUE; TIMING CONSTRAINTS; TOLERANCE BUDGET;

BUDGET CONTROL; DIGITAL STORAGE; MASKS; MATHEMATICAL PROGRAMMING; PHOTOLITHOGRAPHY;

DESIGN;

EID: 84886644528 PISSN: 19483287 EISSN: 19483295 Source Type: Conference Proceeding
DOI: 10.1109/ISQED.2005.93 Document Type: Conference Paper

Times cited : (15)

References (13)

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- Optical Lithography Cost of Ownership-Final Report, http://www.sematech. org/docubse/document/4014atr.pdf
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- Selective gatelength biasing for cost-effective runtime leakage control
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.