Experimental tests and numerical simulation studies on nano-indentation of TiN film deposited on N+-implanted aluminum

Surface and Coatings Technology

Volumn 201, Issue 15, 2007, Pages 6707-6711

  Xu, Ming ^a,c   Li, Liuhe ^a,b   Liu, Youming ^a,c   Cai, Xun ^a   Chen, Qiulong ^a   Chu, Paul K ^c  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

^b BEIHANG UNIVERSITY   (China)

^c CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

FEM; Magnetron sputtering; Mechanical properties; N+ implanted aluminum; Nano indentation; TiN

Indexed keywords

ALUMINUM; COMPUTER SIMULATION; FINITE ELEMENT METHOD; MAGNETRON SPUTTERING; NANOINDENTATION; SHEAR STRESS; STRESS CONCENTRATION; TENSILE STRESS;

LOAD-DISPLACEMENT CURVES; NITROGEN IMPLANTED ALUMINUM;

TITANIUM NITRIDE;

ALUMINUM; COMPUTER SIMULATION; FINITE ELEMENT METHOD; MAGNETRON SPUTTERING; NANOINDENTATION; SHEAR STRESS; STRESS CONCENTRATION; TENSILE STRESS; TITANIUM NITRIDE;

EID: 33847359610     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.09.034     Document Type: Article

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