Effects of high dose nitrogen implantation into aluminum

Vacuum

Volumn 70, Issue 2-3, 2003, Pages 147-152

  Jagielski, J ^a,b   Piatkowska, A ^a   Aubert, P ^c   Legrand Buscema, C ^c   Le Paven, C ^c   Gawlik, G ^a   Piekoszewski, J ^b   Werner, Z ^b  

^a Department of Micro and Nanotechnology of Wide Bandgap Semiconductors   (Poland)

^b SOLTAN INSTITUTE FOR NUCLEAR STUDIES   (Poland)

^c UNIVERSITÉ D EVRY VAL D ESSONNE   (France)

Author keywords

Aluminum nitriding; Ion implantation; Micromechanical properties; Microtopography

Indexed keywords

ALUMINUM; ATOMIC FORCE MICROSCOPY; FRICTION; INDENTATION; NITRIDING; SCANNING ELECTRON MICROSCOPY; SURFACE TOPOGRAPHY; WEAR OF MATERIALS;

MICROTOPOGRAPHY;

ION IMPLANTATION;

EID: 12244262794     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(02)00633-4     Document Type: Conference Paper

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