Thin film passivation of organic light emitting diodes by inductively coupled plasma chemical vapor deposition

Thin Solid Films

Volumn 515, Issue 11, 2007, Pages 4758-4762

  Kim, Han Ki ^a   Kim, Sang Woo ^a   Kim, Do Geun ^b   Kang, Jae Wook ^c   Kim, Myung Soo ^d   Cho, Woon Jo ^e  

^a Kumoh National Institute of Technology   (South Korea)

^b Korea Institute of Machine and Materials   (South Korea)

^c Seoul National University   (South Korea)

^d Samsung SDI   (South Korea)

^e Korea Institute of Science and Technology   (South Korea)

Author keywords

ICP CVD; SiNx; Straight antenna; TOLED

Indexed keywords

PASSIVATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTOR GROWTH; SILICON NITRIDE; SUBSTRATES; THIN FILMS;

HIGH DENSITY PLASMAS; STRAIGHT ANTENNAS; THIN FILM PASSIVATION; TOP-EMITTING ORGANIC LIGHT EMITTING DIODES (TOLED);

LIGHT EMITTING DIODES;

EID: 33847226312     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.11.030     Document Type: Article

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