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Thin Solid Films

Volumn 515, Issue 11, 2007, Pages 4614-4618

Lithium cobalt oxide thin films deposited at low temperature by ionized magnetron sputtering

(1) Chiu, K F a

a FENG CHIA UNIVERSITY (Taiwan)

Author keywords

Electrochemistry; Ion bombardment; Plasma processing and deposition; Sputtering

Indexed keywords

COBALT COMPOUNDS; CRYSTALLOGRAPHY; ELECTROCHEMISTRY; INDUCTIVELY COUPLED PLASMA; ION BOMBARDMENT; IONIZATION; LITHIUM COMPOUNDS; MAGNETRON SPUTTERING; RADIO FREQUENCY AMPLIFIERS; SPUTTER DEPOSITION;

IONIZED MAGNETRON SPUTTERING; LITHIUM COBALT OXIDE THIN FILMS; PLASMA IRRADIATION; PLASMA PROCESSING AND DEPOSITION;

THIN FILMS;

EID: 33847158415 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2006.11.073 Document Type: Article

Times cited : (30)

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