Modification of sputter-deposited nanocrystalline Li xMn 2-yO 4 thin-film cathodes by in situ substrate bias and postanneal

Journal of the Electrochemical Society

Volumn 152, Issue 10, 2005, Pages

  Chiu, K F ^a,c   Lin, H C ^b   Lin, K M ^a   Tsai, C H ^d  

^a FENG CHIA UNIVERSITY   (Taiwan)

^b NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^c ELECTROCHEMICAL SOCIETY   (Taiwan)

^d NONE

Author keywords

[No Author keywords available]

Indexed keywords

FILM STRESS; NEGATIVE ELECTRIC BIAS; POSTANNEALED FILMS; SPINEL STRUCTURE;

ANNEALING; CRYSTALLINE MATERIALS; CRYSTALLOGRAPHY; DEPOSITION; ELECTRIC CURRENTS; ELECTRIC DISCHARGES; MAGNETRON SPUTTERING; MANGANESE COMPOUNDS; NANOSTRUCTURED MATERIALS; RAMAN SPECTROSCOPY; SPUTTER DEPOSITION; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

LITHIUM COMPOUNDS;

EID: 27644598202     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2034524     Document Type: Article

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