Crystallization of lithium cobalt oxide thin films by radio-frequency plasma irradiation

Journal of Applied Physics

Volumn 90, Issue 12, 2001, Pages 5940-5945

  Kang, Youn Seon ^a   Lee, Ho ^a   Kang, Yong Mook ^a   Lee, Paul S ^a   Lee, Jai Young ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035894296     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1416136     Document Type: Article

References (18)

1. S. T. Johnson, J. S. Williams, E. Nygren, and R. G. Elliman, J. Appl. Phys. 64, 6567 (1988).
2. J. Liu, C. J. Barbero, J. W. Corbett, K. Rajan, and H. Leary, Mater. Res. Soc. Symp. Proc. 311, 239 (1993).
3. G. J. Exarhos and N. J. Hess, Mater. Res. Soc. Symp. Proc. 321, 393 (1993).
4. D. Wicaksana, T. Tsujikawa, A. Kobayashi, K. Ono, and A. Kinbara, Mater. Res. Soc. Symp. Proc. 311, 233 (1993).
5. H. Y. Kim, C. D. Park, Y. S. Kang, K. J. Jang, and J. Y. Lee, J. Vac. Sci. Technol. A 18, 2085 (2000).
6. M. H. Cho, Y. S. Kang, H. Y. Kim, P. S. Lee, and J. Y. Lee, J. Electrochem. Soc. 147, 3535 (2000).
7. M. H. Cho, Y. S. Kang, H. Y. Kim, P. S. Lee, and J. Y. Lee, Electrochem. Solid-State Lett. 4, F7 (2001).
8. Y. S. Kang, Ho Lee, S. C. Park, P. S. Lee, and J. Y. Lee, J. Electrochem. Soc. (submitted).
9. G. Wei, T. E. Hass, and R. B. Goldner, Solid State Ionics 58, 115 (1992).
10. C. H. Chen, A. A. J. Buysman, E. M. Kelder, and J. Schoonman, Solid State Ionics 80, 1 (1995).
11. M. Antaya, J. R. Dahn, J. S. Preston, E. Rossen, and J. N. Reimers, J. Electrochem. Soc. 140, 575 (1993).
12. B. Wang, J. B. Bates, F. X. Hart, B. C. Sales, R. A. Zuhr, and J. D. Robertson, J. Electrochem. Soc. 143, 3203 (1993).
13. M. Antaya, K. Cearns, J. S. Preston, J. N. Reimers, and J. R. Dahn, J. Appl. Phys. 76, 2799 (1994).
14. J. R. Dahn, U. von Sacken, and C. A. Michael, Solid State Ionics 44, 87 (1990).
15. J. B. Bates, N. J. Dudney, B. J. Neudecker, F. X. Hart, H. P. Jun, and S. A. Hackney, J. Electrochem. Soc. 147, 59 (2000).
16. K. N. Tu, J. W. Mayer, and L. C. Feldman, Electronic Thin Film Science for Electrical Engineers and Materials Scientist (Macmillan, New York, 1992), Chap. 10.
17. M. Sugawara, Plasma Etching: Fundamentals and Applications (Oxford University Press, New York, 1998), Chap. 7.
18. B. Chapman, Glow Charge Processes (Wiley, New York, 1980), Chap. 6.