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Volumn 3, Issue 3, 2006, Pages 425-434
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Effect of oxygen for ultra-thin la2O3 film deposition
a a a a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
DEPOSITION;
ELECTRODES;
ELECTRON TRAPS;
INTERFACES (MATERIALS);
LANTHANUM COMPOUNDS;
MOS CAPACITORS;
ULTRATHIN FILMS;
FLAT-BAND VOLTAGE;
LA-SILICATE;
OXYGEN VACANCY;
OXYGEN;
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EID: 33846964939
PISSN: 19385862
EISSN: 19386737
Source Type: Conference Proceeding
DOI: 10.1149/1.2355731 Document Type: Conference Paper |
Times cited : (23)
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References (13)
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