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Volumn 515, Issue 7-8, 2007, Pages 3844-3846

Enhancing the crystallization fraction performance of nano-crystalline silicon thin films with argon and hydrogen annealing

Author keywords

Argon ratio; Crystallization fraction (Xc); Layer by layer; Nano silicon (nc Si)

Indexed keywords

ANNEALING; ARGON; CHEMICAL VAPOR DEPOSITION; CRYSTALLIZATION; NANOSTRUCTURED MATERIALS; SEMICONDUCTING SILICON;

EID: 33846933969     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.10.075     Document Type: Article
Times cited : (6)

References (10)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.