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Volumn 515, Issue 7-8, 2007, Pages 3844-3846
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Enhancing the crystallization fraction performance of nano-crystalline silicon thin films with argon and hydrogen annealing
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Author keywords
Argon ratio; Crystallization fraction (Xc); Layer by layer; Nano silicon (nc Si)
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Indexed keywords
ANNEALING;
ARGON;
CHEMICAL VAPOR DEPOSITION;
CRYSTALLIZATION;
NANOSTRUCTURED MATERIALS;
SEMICONDUCTING SILICON;
ARGON RATIO;
CRYSTALLIZATION FRACTION (XC);
LAYER-BY-LAYER CHEMICAL VAPOR DEPOSITION;
NANO-SILICON (NC-SI);
THIN FILMS;
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EID: 33846933969
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2006.10.075 Document Type: Article |
Times cited : (6)
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References (10)
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