Supercritical carbon dioxide-assisted oxidative degradation and removal of polymer residue after reactive ion etching of photoresist

Green Chemistry

Volumn 9, Issue 2, 2007, Pages 133-138

  Lo, Bertrand ^a   Tai, ChuChun ^a   Chang, JiaYaw ^a   Wu, ChienHui ^a   Chen, BoJung ^a   Kuo, Tzu Chen ^b   Lian, Pei Jung ^b   Ling, YongChien ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b METAL INDUSTRIES RESEARCH AND DEVELOPMENT CENTRE   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33846913647     PISSN: 14639262     EISSN: 14639270     Source Type: Journal    
DOI: 10.1039/b602885c     Document Type: Article

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