Novel method for photoresist stripping using ozone/de-ionized water chemistry

IEEE International Symposium on Semiconductor Manufacturing Conference, Proceedings

Volumn , Issue , 1997, Pages 81-85

  Kashkoush, Ismail ^a   Novak, Rich ^a   Matthews, Robert ^a  

^a SubMicron Systems Corp   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COST EFFECTIVENESS; HYDROGEN PEROXIDE; MIXTURES; OZONE; PHOTORESISTS; SILICON WAFERS; STRIPPING (REMOVAL); SULFURIC ACID; WATER;

DEIONIZED WATER; HARD BAKED RESISTS;

SEMICONDUCTOR DEVICE MANUFACTURE;

EID: 0031365661     PISSN: 10788743     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (3)