The molecular mechanism of novolak resists

Journal of Imaging Science and Technology

Volumn 42, Issue 1, 1998, Pages 15-22

  Reiser, Arnost ^a,b  

^a POLYTECHNIC UNIVERSITY   (United States)

^b IS and T ^*  (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBOXYLATION; DISSOLUTION; HYDROGEN BONDS; LIGHT POLARIZATION; OPTICAL FILMS; PERCOLATION (SOLID STATE); PHENOLIC RESINS; PHOTOLYSIS; REACTION KINETICS;

NOVOLAK DIAZOQUINONE RESISTS; POLARIZED HYDROXYLS;

PHOTORESISTS;

EID: 0031702413     PISSN: 10623701     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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