Enhancing the dry-etch durability of photoresist masks: A review of the main approaches

Russian Microelectronics

Volumn 36, Issue 1, 2007, Pages 40-48

  Zelentsov, S V ^a   Zelentsova, N V ^a   Kolesov, A N ^a   Bogatyreva, L A ^a   Mashtakov, I A ^a  

^a LOBACHEVSKY STATE UNIVERSITY OF NIZHNY NOVGOROD   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

DRY ETCHING; DURABILITY; MICROELECTRONICS;

CHEMICAL PROCESSES; DRY-ETCH DURABILITY; PHOTORESIST MASKS;

PHOTORESISTORS;

EID: 33846847361     PISSN: 10637397     EISSN: None     Source Type: Journal    
DOI: 10.1134/S1063739707010052     Document Type: Article

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