Deep-UV hardening of deep-UV resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2724, Issue , 1996, Pages 588-600

  Jordhamo, George ^a   Moreau, Wayne M ^a  

^a IBM MICROELECTRONICS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COPOLYMERS; CROSSLINKING; ELECTRON BEAMS; ETCHING; HARDENING; HIGH TEMPERATURE PROPERTIES; ION IMPLANTATION; STABILITY; ULTRAVIOLET RADIATION;

POLYHYDROXYSTYRENE; REACTIVE ION ETCHING;

PHOTORESISTS;

EID: 0029748834     PISSN: None     EISSN: None     Source Type: None    
DOI: 10.1117/12.241857     Document Type: Conference Paper

References (27)