The effect of substrate temperature on filtered vacuum arc deposited zinc oxide and tin oxide thin films

Journal of Crystal Growth

Volumn 299, Issue 2, 2007, Pages 259-267

  Cetinorgu E ^a,b   Goldsmith, S ^a   Boxman, R L ^a  

^a TEL AVIV UNIVERSITY   (Israel)

^b CUKUROVA UNIVERSITY   (Turkey)

Author keywords

A1. Characterization; A3. Filtered vacuum arc deposition; B1. Tin oxide; B1. Zinc oxide

Indexed keywords

ATOMIC FORCE MICROSCOPY; FUSED SILICA; SUBSTRATES; THIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

ABSORPTION COEFFICIENT; FILTERED VACUUM ARC DEPOSITION; TIN OXIDE;

ZINC OXIDE;

EID: 33846785134     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2006.11.334     Document Type: Article

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