Novel cleaning techniques to achieve defect-free photomasks for sub-65nm nodes

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6349 I, Issue , 2006, Pages

  Ryu, Jin Ho ^a   Lee, Dong Wook ^a   Ryu, Ji Sun ^a   Kim, Sang Pyo ^a   Han, Oscar ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

After development clean (ADC); Haze; Ozonated water (DIO3); UV O3 treatment

Indexed keywords

CLEANING; CONTAMINATION; CRYSTAL DEFECTS; PHOTORESISTS; SEMICONDUCTOR DEVICE MANUFACTURE;

AFTER-DEVELOPMENT CLEAN (ADC); FATAL DEFECTS; HAZE; OZONATED WATER;

PHOTOLITHOGRAPHY;

EID: 33846608279     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.686545     Document Type: Conference Paper

References (7)

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