Investigation of sulfate free clean processes for next generation lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5992, Issue 2, 2005, Pages

  Chovino, Christian ^a   Helbig, Stefan ^b   Haschke, Petr ^b   Saule, Werner ^b  

^a Advanced Mask Technology Center GmbH and Co KG   (Germany)

^b STEAG AG   (Germany)

Author keywords

Contamination; Hydrogen water; NGL; Ozonated water; Photomask; Sulfate; Wet cleaning

Indexed keywords

CONTAMINATION; CRYSTAL GROWTH; HYDROGEN; IMPURITIES; MASKS; OPTICAL PROPERTIES; SULFUR COMPOUNDS; WATER;

HYDROGEN WATER; OZONATED WATER; PHOTOMASK; SULFATE;

LITHOGRAPHY;

EID: 33644595344     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.632055     Document Type: Conference Paper

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