Identification of defect source to control reticle defect density for CAR and dry etching in the photomask process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5130, Issue , 2003, Pages 107-117

  Cho, Sung Yong ^a   Ahn, Won Suk ^a   Cho, Won Il ^a   Sung, Moon Gyu ^a   Kim, Yong Hoon ^a   Choi, Sung Woon ^a   Yoon, Hee Sun ^a   Sohn, Jung Min ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

AFM; After develop inspection; Blank inspection; CD SEM; Defect; Pinhole; Quartz fitting

Indexed keywords

ATOMIC FORCE MICROSCOPY; COMPUTER SOFTWARE; DEFECTS; LITHOGRAPHY; MASKS; OPTICAL MICROSCOPY; OPTIMIZATION; QUARTZ APPLICATIONS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DEVICE MANUFACTURE; SURFACE PROPERTIES; WSI CIRCUITS;

AFTER DEVELOP INSPECTION (ADI); BLANK INSPECTION (BI); CD SEM; CRITICAL DIMENSIONS (CD); PINHOLE; QUARTZ FITTING; RETICLE DEFECTS;

DRY ETCHING;

EID: 1642433151     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.504055     Document Type: Conference Paper

References (7)

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