Effect of UV/O3 treatment on mask surface to reducing sulfuric residue ions

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5567, Issue PART 1, 2004, Pages 521-528

  Lee, Dong Wook ^a   Jung, Ho Yong ^a   Kim, Mun Sik ^a   Lee, Jun Sik ^a   Choi, Yong Kyoo ^a   Han, Oscar ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

MoSiN surface; Sulfuric residue ions; UV O3 treatment

Indexed keywords

AMORPHOUS MATERIALS; CLEANING; CONTAMINATION; MOLYBDENUM COMPOUNDS; OZONE; QUARTZ; SURFACE PHENOMENA; ULTRAVIOLET RADIATION;

MOSIN SURFACE; SULFURIC RESIDUE IONS; SURFACE TRANSFORMATION; UV/O3 TREATMENT;

MASKS;

EID: 19844372504     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.569015     Document Type: Conference Paper

References (6)

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