Chemical vapor deposition of Y2O3 films using Y(dpm)3

Inorganic Materials

Volumn 38, Issue 4, 2002, Pages 371-373

  Bakovets, V V ^a   Levashova, T M ^a   Ratushnyak, V T ^a   Bakhturova, L F ^a  

^a NIKOLAEV INSTITUTE OF INORGANIC CHEMISTRY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; HYDROGEN PEROXIDE; OXIDE; UNCLASSIFIED DRUG; YTTRIUM; YTTRIUM TRIS(2,2,6,6 TETRAMETHYL 3,5 HEPTANEDIONATE);

ARTICLE; ATMOSPHERIC PRESSURE; CHEMICAL ANALYSIS; CHEMICAL STRUCTURE; DECOMPOSITION; ELECTROCHEMISTRY; ELLIPSOMETRY; FILM; INFRARED RADIATION; KINETICS; REFRACTION INDEX; STRUCTURE ANALYSIS; SURFACE PROPERTY; THERMAL ANALYSIS; VAPOR;

EID: 9344240454     PISSN: 00201685     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1015110023168     Document Type: Article

References (9)

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