Composition and texture of TiN thin films fabricated by ECR enhanced sputtering deposition

Surface and Coatings Technology

Volumn 201, Issue 9-11 SPEC. ISS., 2007, Pages 5537-5540

  Liang, Chang Lin ^a   Cheng, Guo An ^a   Zheng, Rui Ting ^a   Liu, Hua Ping ^a   Li, Jie Chi ^a   Zhang, Hua Fang ^b   Ma, Guo Jia ^b   Jiang, Yan Li ^b  

^a BEIJING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

^b Aeronautical Key Laboratory for Additive Manufacturing Technologies   (China)

Author keywords

Composition; ECR; Texture; TiN films

Indexed keywords

ELECTRON CYCLOTRON RESONANCE; IMPURITIES; ION BOMBARDMENT; MORPHOLOGY; SURFACE TREATMENT; THIN FILMS; TITANIUM NITRIDE;

ATOMIC RATIO; PREFERENTIAL ORIENTATION;

SPUTTER DEPOSITION;

ELECTRON CYCLOTRON RESONANCE; IMPURITIES; ION BOMBARDMENT; MORPHOLOGY; SPUTTER DEPOSITION; SURFACE TREATMENT; THIN FILMS; TITANIUM NITRIDE;

EID: 33846466446     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.07.107     Document Type: Article

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