Highly adhesive TiN thin films prepared on glass by the electron shower method

Thin Solid Films

Volumn 281-282, Issue 1-2, 1996, Pages 311-313

  Yumoto, H ^a   Kaneko, K ^a   Ishihara, M ^a   Kato, Y ^a   Akashi, K ^a  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

Interfaces; Physical vapour deposition; Titanium nitride; X ray photoelectron spectroscopy

Indexed keywords

ADHESION; CHEMICAL ANALYSIS; CHEMICAL VAPOR DEPOSITION; ELECTRON SPECTROSCOPY; ELECTROPLATING; FILM PREPARATION; GLASS; INTERFACES (MATERIALS); MAGNETRON SPUTTERING; SILICA; TITANIUM NITRIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

ADHESIVE PROPERTIES; ARC ION PLATING; ELECTRON SHOWER METHOD; ELECTRON SPECTROSCOPY FOR CHEMICAL ANALYSIS; PHYSICAL VAPOR DEPOSITION;

THIN FILMS;

EID: 0030219584     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/0040-6090(96)08639-7     Document Type: Article

References (5)

1. S. Suzuki, H. Kojima and K. Suzuki, Rep. Res. Lab. Asahi Glass Co. Ltd., 40 (1990) 225.
2. P.J. Martin, D.R. Mckenzie, R.P. Netterfield, P, Swift, S.W. Filipczuk, K.H. Muller, C.G. Pacey and B. James, Thin Solid Films, 153 (1987) 91.
3. H. Yumoto, K. Watanabe, K. Akashi and N. Igata, Appl. Surf. Sci., 48 (1991) 173.
4. H. Yumoto, K. Kaneko, M. Ishihara, K. Akashi and T. Kaneko, Adv. Mater. Opt. Elec., 5 (1995) 191.
5. R.A. Swalin, Thermodynamics of Solids, Wiley, New York, 1962, Chapter 7.5.