Effects of electrostatic discharge high-field current impulse on oxide breakdown

Journal of Applied Physics

Volumn 101, Issue 1, 2007, Pages

  Tseng, Jen Chou ^b   Hwu, Jenn Gwo ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b NONE

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITORS; ELECTRIC BREAKDOWN; ELECTROSTATIC DEVICES; INTERFACES (MATERIALS); MOS DEVICES; PRESTRESSING; SILICON COMPOUNDS;

ELECTROSTATIC DISCHARGE (ESD); HIGH FIELD CURRENT IMPULSE STRESS; HIGH FIELD PRESTRESS TESTS; STRESS TESTING;

ELECTRIC DISCHARGES;

EID: 33846300678     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2404470     Document Type: Article

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