Gas-phase diffusion and surface reaction as limiting mechanisms in the aerosol-assisted chemical vapor deposition of TiO2 films from titanium diisopropoxide

Journal of Materials Research

Volumn 21, Issue 12, 2006, Pages 3205-3209

  Conde Gallardo, A ^a   Guerrero, M ^a   Fragoso, R ^a   Castillo, N ^a  

^a DEPARTAMENTO DE FÍSICA   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; AEROSOLS; CRYSTALLINE MATERIALS; DIFFUSION IN GASES; MORPHOLOGY; SURFACE REACTIONS; THERMAL EFFECTS; THIN FILMS; TITANIUM DIOXIDE;

GAS-PHASE DIFFUSION; THERMAL REACTION; TITANIUM DIISOPROPOXIDE;

METALLORGANIC CHEMICAL VAPOR DEPOSITION;

EID: 33846287200     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2006.0391     Document Type: Article

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