Thickness Effect on the Physical Properties of Evaporated SnS Films

Journal of the Electrochemical Society

Volumn 154, Issue 2, 2007, Pages

  Devika, M ^a   Reddy, N Koteeswara ^b   Ramesh, K ^b   Ganesan, R ^b   Gunasekhar, K R ^b   Gopal, E S R ^b   Reddy, K T Ramakrishna ^a  

^a SRI VENKATESWARA UNIVERSITY   (India)

^b INDIAN INSTITUTE OF SCIENCE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; CRYSTAL STRUCTURE; ELECTRIC CONDUCTIVITY; ENERGY DISPERSIVE SPECTROSCOPY; EVAPORATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; THICKNESS MEASUREMENT;

THICKNESS EFFECTS; VAN DER PAUW METHODS;

TIN COMPOUNDS;

EID: 33846256705     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2398816     Document Type: Article

References (43)

1. J. F. Geisz and D. J. Friedman, Semicond. Sci. Technol., 17, 769 (2002).
2. L. Brus, Appl. Phys. A, 53, 465 (1991).
3. M. Caria, L. Barberini, S. Cadeddu, A. Giannattasio, A. Rusani, A. Sesselego, A. Lai, S. D'Auria, and F. Dubecky, Appl. Phys. Lett., 81, 1506 (2002).
4. A. Gupta and A. D. Compaan, Appl. Phys. Lett., 85, 684 (2004).
5. J. Pantoja-Enríquez, X. Mathew, G. P. Hernández, U. Pal, C. Magaa, D. R. Acosta, R. Guardian, J. A. Toledo, G. Contreras-Puente, and J. A. Chávez-Carvayar, Sol. Energy Mater. Sol. Cells, 82, 307 (2004).
6. A. S. Riad, S. Darwish, and H. H. Afify, Thin Solid Films, 391, 109 (2001).
7. H. Dittrich, D. J. Vaughan, R. A. D. Pattrick, S. Graeser, M. Lux-Steiner, R. Kunst, and D. Lincot, in 13th European PVSEC, Nice, France, (1995).
8. A. Tanusevski and D. Poelman, Sol. Energy Mater. Sol. Cells, 80, 297 (2003).
9. R. D. Engelken, H. E. McCloud, C. Lec, M. Slayton, and H. Ghoreishi, J. Electrochem. Soc., 134, 2696 (1987).
10. A. Ortiz, J. C. Alonso, M. Garcia, and J. Toriz, Semicond. Sci. Technol., 11, 243 (1996).
11. K. Mishra, K. Rajeshwar, A. Weiss, M. Murley, R. D. Engelken, M. Slayton, and H. E. McCloud, J. Electrochem. Soc., 136, 7 (1989).
12. M. Ichimura, K. Takenchi, Y. Ono, and E. Arai, Thin Solid Films, 361-362, 98 (2000).
13. N. Koteeswara Reddy and K. T. Ramakrishna Reddy, Thin Solid Films, 325, 4 (1998).
14. Z. Zainal, M. Z. Hussein, and A. Ghazali, Sol. Energy Mater. Sol. Cells, 40, 347 (1996).
15. A. Chazali, Z. Zainal, M. Z. Hussein, and A. Kassim, Sol. Energy Mater. Sol. Cells, 55, 237 (1998).
16. J. B. Johnson, H. Jones, B. S. Latham, J. D. Parker, R. D. Engelken, and C. Barber, Semicond. Sci. Technol., 14, 501 (1999).
17. B. Thangaraju and P. Kaliannan, J. Phys. D, 33, 1054 (2000).
18. J. J. Loferski, J. Appl. Phys., 27, 777 (1956).
19. M. Sharon and K. Basavaswaran, Sol. Cells, 25, 97 (1988).
20. N. Koteeswara Reddy and K. T. Ramakrishna Reddy, Physica B, 368, 25 (2005).
21. M. Ristov, Gj. Sinadinovski, I. Grozdanov, and M. Mitreski, Thin Solid Films, 173, 53 (1989).
22. M. T. S. Nair and P. K. Nair, Semicond. Sci. Technol., 6, 132 (1991).
23. W. Albers, C. Hass, H. J. Vink, and J. D. Wasscher, Jpn. J. Appl. Phys., Suppl., 32, 2220 (1996).
24. D. A. Luh, T. Miller, J. J. Paggel, and T. C. Chiang, Phys. Rev. Lett., 88, 256802 (2002).
25. O. Pfennigstorf, A. Petkova, H. L. Guenter, and M. Henzler, Phys. Rev. B, 65, 045412 (2002).
26. B. G. Orr, H. M. Jaeger, and A. M. Goldman, Phys. Rev. Lett., 53, 2046 (1984).
27. M. Devika, K. T. Ramakrishna Reddy, N. Koteeswara Reddy, K. Ramesh, R. Ganesan, K. R. Gunasekhar, and E. S. R. Gopal, J. Appl. Phys., 100, 023518 (2006).
28. N. Koteeswara Reddy, K. Ramesh, R. Ganesan, K. T. Ramakrishna Reddy, K. R. Gunasekhar, and E. S. R. Gopal, Appl. Phys. A, 83, 133 (2006).
29. E. Elangovan, M. P. Singh, and K. Ramamurthi, Mater. Sci. Eng., B, 113, 143 (2004).
30. H. Noguchi, A. Setiyadi, H. Tanamura, T. Nagatomo, and O. Omoto, Sol. Energy Mater. Sol. Cells, 35, 325 (1994).
31. K. L. Chopra, Thin Film Phenomena, p. 270, McGraw Hill, New York (1969).
32. P. K. R. Kalita, B. K. Sarma, and, H. L. Das, Bull. Mater. Sci., 23, 313 (2000).
33. P. N. Paraskevopoulos, V. Rudnev, D. Loveless, R. Cook, M. Black, and R. I. Rudnev, Handbook of Induction Heating, p. 101, Marcel Dekker, New York (2003).
34. R. Bonnett, G. P. Zhigalskii, and Z. Zhigal'skii, Physical Properties of Thin Metal Films, p. 32, Taylor & Francis, London (2003).
35. A. U. Ubale and D. K. Kulkarni, Bull. Mater. Sci., 28, 43 (2005).
36. R. L. Naone and L. A. Coldren, J. Appl. Phys., 82, 2277 (1997).
37. R. D. Engelken, H. E. McCloud, E. Lee, M. Slayton, and H. Ghoreishi, J. Electrochem. Soc., 134, 2696 (1987).
38. J. Tauc, in Optical Properties of Solids, F. Abeles, Editor, p. 903, North Holland, Amsterdam (1970).
39. P. Pramanik, P. K. Basu, and S. Biswas, Thin Solid Films, 150, 269 (1987).
40. W. Guang-Pu, Z. Zhi-Lin, Z. Wei-Ming, G. Xiang-Hong, C. Wei-Qun, H. Tanamura, M. Yamaguchi, H. Noguchi, T. Nagatomo, and O. Omoto, First WCPEC, Hawaii (1994).
41. R. S. Mane and C. D. Lokhande, Mater. Chem. Phys., 82, 347 (2003).
42. A. M. Elkorashy, Semicond. Sci. Technol., 4, 382 (1989).
43. C. Haas and M. M. G. Corbey, J. Phys. Chem. Solids, 20, 197 (1961).