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Volumn 2006, Issue , 2006, Pages 72-78

Boron and boron-based coatings as deposited by the cathodic arc technique

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM CASTINGS; BORON; BORON CARBIDE; CATHODES; DEPOSITION; PLASMA APPLICATIONS; SYNTHESIS (CHEMICAL);

EID: 33846235947     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (1)

References (21)
  • 1
    • 0000366813 scopus 로고
    • Hard Boron Oxide Thin-Film Deposition Using Electron Resonance Microwave Plasmas
    • Gorbatkin, S.M., Rhoades, R.L., Tsui, T.Y, Oliver, W.C., "Hard Boron Oxide Thin-Film Deposition Using Electron Resonance Microwave Plasmas," Appl. Phys. Lett., Vol. 65, No. 21 (1994) pp.2672-2674
    • (1994) Appl. Phys. Lett , vol.65 , Issue.21 , pp. 2672-2674
    • Gorbatkin, S.M.1    Rhoades, R.L.2    Tsui, T.Y.3    Oliver, W.C.4
  • 3
    • 0031095229 scopus 로고    scopus 로고
    • Filtered Cathodic Arc Evaporation Source with a Heated Boron Cathode
    • Surf. Coat. Technology
    • Richter, F., Krannich, G., Hahn, J., Pintaske, R., Friedrich, M., Schmidbauer, S., Zahn, D.R.T., "Filtered Cathodic Arc Evaporation Source with a Heated Boron Cathode," Surf. Coat. Technology, Vol.90 (1997) pp.178.
    • (1997) , vol.90 , pp. 178
    • Richter, F.1    Krannich, G.2    Hahn, J.3    Pintaske, R.4    Friedrich, M.5    Schmidbauer, S.6    Zahn, D.R.T.7
  • 5
    • 0035269478 scopus 로고    scopus 로고
    • Vacuum Arc Deposited Boron Carbide Films for Fusion Plasma Facing Components
    • Mar
    • Klepper, C.C., Niemel, J., Hazelton, R.C., Yadlowsky, E.J., Monteiro, O.R., "Vacuum Arc Deposited Boron Carbide Films for Fusion Plasma Facing Components," Fusion Technology, Vol. 39, No. 2 (Mar 2001) pp.910-915.
    • (2001) Fusion Technology , vol.39 , Issue.2 , pp. 910-915
    • Klepper, C.C.1    Niemel, J.2    Hazelton, R.C.3    Yadlowsky, E.J.4    Monteiro, O.R.5
  • 6
    • 33846193947 scopus 로고    scopus 로고
    • Method and Apparatus for Depositing Ceramic Films by Vacuum Arc Deposition,
    • U.S. Patent 6,495,002
    • Klepper, C.C., Hazelton, R.C., Niemel, J., Keitz, M., Yadlowsky, E.J. "Method and Apparatus for Depositing Ceramic Films by Vacuum Arc Deposition," U.S. Patent 6,495,002.
    • Klepper, C.C.1    Hazelton, R.C.2    Niemel, J.3    Keitz, M.4    Yadlowsky, E.J.5
  • 8
    • 33846193101 scopus 로고    scopus 로고
    • Microwave Processing of Pressed Boron Powders for use as Cathodes in Vacuum Arc Sources,
    • U.S. Patent 6,562,418
    • Morrow, M.S., Schechter, D.E., Tsai, C.C., Klepper, C.C, Hazelton, R.C., and Niemel, J., "Microwave Processing of Pressed Boron Powders for use as Cathodes in Vacuum Arc Sources," U.S. Patent 6,562,418.
    • Morrow, M.S.1    Schechter, D.E.2    Tsai, C.C.3    Klepper, C.C.4    Hazelton, R.C.5    Niemel, J.6
  • 10
    • 0031643548 scopus 로고    scopus 로고
    • Cathodic Arc Deposition of Films
    • Brown, Ian G., "Cathodic Arc Deposition of Films," Annu. Rev. Mater. Sci. 28, 243 (1998).
    • (1998) Annu. Rev. Mater. Sci , vol.28 , pp. 243
    • Brown, I.G.1
  • 13
    • 0033512093 scopus 로고    scopus 로고
    • Approaches to Rid Cathodic Arc Plasmas of Macro and Nanoparticles: A Review
    • Anders, A., "Approaches to Rid Cathodic Arc Plasmas of Macro and Nanoparticles: A Review," Surface and Coating Technology, Vol. 120-121 (1999) pp. 319-330.
    • (1999) Surface and Coating Technology , vol.120-121 , pp. 319-330
    • Anders, A.1
  • 14
    • 0026833174 scopus 로고
    • Macroparticle Contamination in Cathodic Arc Coatings: Generation, Transport, and Control
    • Boxman, R.L., Goldsmith, S., "Macroparticle Contamination in Cathodic Arc Coatings: Generation, Transport, and Control," Surface & Coatings Technology, Vol. 52, (1992) pp39-50.
    • (1992) Surface & Coatings Technology , vol.52 , pp. 39-50
    • Boxman, R.L.1    Goldsmith, S.2
  • 16
    • 23444437078 scopus 로고    scopus 로고
    • Ion Implantation of Boron into Silicon by Use of the Boron Cathodic-Arc Plasma Generatorl: First Results
    • to be published
    • Williams, J.M., Klepper, C.C., Hazelton, R.C., "Ion Implantation of Boron into Silicon by Use of the Boron Cathodic-Arc Plasma Generatorl: First Results," Nucl. Instr. Methods B, to be published (2005).
    • (2005) Nucl. Instr. Methods B
    • Williams, J.M.1    Klepper, C.C.2    Hazelton, R.C.3
  • 17
    • 33846258385 scopus 로고    scopus 로고
    • Pourbaix, M., Atlas of Electrochemical Equilibria in Agueous Solutions, James A.Franklin Translation, Peigamon (London, England 1966).
    • Pourbaix, M., Atlas of Electrochemical Equilibria in Agueous Solutions, James A.Franklin Translation, Peigamon (London, England 1966).
  • 18
    • 0025671483 scopus 로고
    • A Study of the Formation and Self Lubrication Mechanisms of Boric Acid Films on Boric Oxide Coatings
    • Erdemir, A., Fenske, G.R., and Erck, R.A., "A Study of the Formation and Self Lubrication Mechanisms of Boric Acid Films on Boric Oxide Coatings," Surf. Coat. Technol., Vol. 43/44 (1990), pp.588-596.
    • (1990) Surf. Coat. Technol , vol.43-44 , pp. 588-596
    • Erdemir, A.1    Fenske, G.R.2    Erck, R.A.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.