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Volumn 6375, Issue , 2006, Pages

Development of super-resolution optical inspection system for semiconductor defects using standing wave illumination shift

Author keywords

Optical inspection; Semiconductor defects; Standing wave illumination; Super resolution

Indexed keywords

CRYSTAL DEFECTS; DEFECTS; LIGHT SCATTERING; OPTICAL RESOLVING POWER; PHOTODETECTORS;

EID: 33846221963     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.690582     Document Type: Conference Paper
Times cited : (6)

References (9)
  • 2
    • 0242609382 scopus 로고    scopus 로고
    • Mark A. Schulze, Martin A. Hunt, Edgar Voelkl, Joel D. Hickson, William Usry, Randall G. Smith, Robert Bryant and C. E. (Tommy) Thomas Jr. Semiconductor wafer defect detection using digital holography Proc. SPIE's Advanced Microelectronic Micromanufacturing, 27-28 February 2003
    • Mark A. Schulze, Martin A. Hunt, Edgar Voelkl, Joel D. Hickson, William Usry, Randall G. Smith, Robert Bryant and C. E. (Tommy) Thomas Jr. "Semiconductor wafer defect detection using digital holography" Proc. SPIE's Advanced Microelectronic Micromanufacturing, 27-28 February 2003
  • 3
    • 33846187281 scopus 로고    scopus 로고
    • Semiconductor Defect Classification using Hyperellipsoid Clustering Neural Networks and Model Switching
    • IJCNN'99
    • Keisuke Kameyama, Yukio Kosugi, "Semiconductor Defect Classification using Hyperellipsoid Clustering Neural Networks and Model Switching", Proc. IJCNN'99, 1999
    • (1999) Proc
    • Kameyama, K.1    Kosugi, Y.2
  • 4
    • 0041859276 scopus 로고    scopus 로고
    • Jeffery R. Price, Philip R. Bingham, Kenneth W. Tobin, Jr., Thomas P. Karnowski, Estimating cross-section semiconductor structure by comparing top-down SEM images, Machine Vision Applications in Industrial Inspection XI (Proc. SPIE/IS&T 5011), pp. 161-170, 2003
    • Jeffery R. Price, Philip R. Bingham, Kenneth W. Tobin, Jr., Thomas P. Karnowski, "Estimating cross-section semiconductor structure by comparing top-down SEM images", Machine Vision Applications in Industrial Inspection XI (Proc. SPIE/IS&T Vol. 5011), pp. 161-170, 2003
  • 5
    • 33645076110 scopus 로고    scopus 로고
    • MODELING, MEASUREMENT, AND STANDARDS FOR WAFER INSPECTION
    • the Government Microcircuits Applications and Critical Technologies (GOMACTech) Conference, March 31 to April 3
    • George W. Mulholland and Thomas A. Germer, "MODELING, MEASUREMENT, AND STANDARDS FOR WAFER INSPECTION", Proc. the Government Microcircuits Applications and Critical Technologies (GOMACTech) Conference, March 31 to April 3, 2003
    • (2003) Proc
    • Mulholland, G.W.1    Germer, T.A.2
  • 6
    • 13544254532 scopus 로고    scopus 로고
    • DUV Optical Wafer Inspection System for 65-nm Technology Node
    • Kenji Watanabe, Shunji Maeda, Tomohiro Funakoshi and Yoko Miyazaki, "DUV Optical Wafer Inspection System for 65-nm Technology Node", Hitachi Review Vol. 54, No. 1, pp22-26, 2005
    • (2005) Hitachi Review , vol.54 , Issue.1 , pp. 22-26
    • Watanabe, K.1    Maeda, S.2    Funakoshi, T.3    Miyazaki, Y.4
  • 7
    • 18144387991 scopus 로고    scopus 로고
    • Volker Westphal and Stefan W. Hell, Nanoscale Resolution in the Focal Plane of an Optical Microscope, PHYSICAL REVIEW LETTERS, No. 143903, 2005
    • Volker Westphal and Stefan W. Hell, "Nanoscale Resolution in the Focal Plane of an Optical Microscope", PHYSICAL REVIEW LETTERS, No. 143903, 2005
  • 8
    • 13844275955 scopus 로고    scopus 로고
    • From micro to nano: Recent advances in high-resolution microscopy
    • Yuval Garini, Bart J Vermolen and Ian T Young, "From micro to nano: recent advances in high-resolution microscopy", Current Opinion in Biotechnology, No. 16:3-12, 2005
    • (2005) Current Opinion in Biotechnology , Issue.16 , pp. 3-12
    • Garini, Y.1    Vermolen, B.J.2    Young, I.T.3
  • 9
    • 14144253041 scopus 로고    scopus 로고
    • Super-Resolution Bright-Field Optical Microscopy Based on Nanometer Topographic Contrast
    • Huang S.W., Mong H.-Y. and Lee C.-H., "Super-Resolution Bright-Field Optical Microscopy Based on Nanometer Topographic Contrast", MICROSCOPY RESEARCH AND TECHNIQUE 65, pp 180-185, 2004
    • (2004) MICROSCOPY RESEARCH AND TECHNIQUE , vol.65 , Issue.4-5 , pp. 180-185
    • Huang, S.W.1    Mong, H.-Y.2    Lee, C.-H.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.