Estimating cross-section semiconductor structure by comparing top-down SEM images

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5011, Issue , 2003, Pages 161-170

  Price, Jeffery R ^a   Bingham, Philip R ^a   Tobin Jr , Kenneth W ^a   Karnowski, Thomas P ^a  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

CD SEM metrology; Image retrieval; Linear discriminant analysis (LDA); Lithography; Semiconductor inspection

Indexed keywords

DATABASE SYSTEMS; IMAGE ANALYSIS; IMAGE RETRIEVAL; IMAGING TECHNIQUES; INSPECTION; LITHOGRAPHY; PRINCIPAL COMPONENT ANALYSIS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR MATERIALS;

CROSS-SECTIONS;

COMPUTER VISION;

EID: 0041859276     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.479691     Document Type: Conference Paper

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