Influence of the carrier gas in the growth kinetics of TiO2 films deposited by aerosol assisted chemical vapor deposition with titanium-diisopropoxide as precursor

Revista Mexicana de Fisica

Volumn 52, Issue 5, 2006, Pages 459-463

  Conde Gallardo, A ^a   Guerrero, M ^a   Soto, A B ^a   Fragoso, R ^a   Castillo, N ^a  

^a DEPARTAMENTO DE FÍSICA   (Mexico)

Author keywords

Growth mechanisms; Metal organic chemical vapor deposition; Spray pyrolysis; TiO2 films

Indexed keywords

EID: 33846091568     PISSN: 0035001X     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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