Stitching-error reduction in gratings by shot-shifted electron-beam lithography

Journal of Lightwave Technology

Volumn 19, Issue 10, 2001, Pages 1527-1531

  Dougherty, David J ^a   Muller, Richard E ^b   Maker, Paul D ^b   Forouhar, Siamak ^b  

^a Scion Photonics   (United States)

^b CALIFORNIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Diffraction; Electron beam lithography; Gratings; Integrated optics; Semiconductor lasers

Indexed keywords

DIFFRACTION GRATINGS; DISTRIBUTED FEEDBACK LASERS; ELECTROMAGNETIC WAVE DIFFRACTION; ELECTRON BEAM LITHOGRAPHY; SEMICONDUCTOR LASERS;

STITCHING-ERROR SUPPRESSIONS;

INTEGRATED OPTICS;

EID: 0035481774     PISSN: 07338724     EISSN: None     Source Type: Journal    
DOI: 10.1109/50.956140     Document Type: Article

References (7)

1. Investigation of the spectral characteristics of DFB lasers with different grating configurations made by electron-beam lithography
2. Corrugation-pitch modulated MQW-DFB lasers with narrow spectral linewidth
3. GaAs/AlGaAs first-order gratings fabricated with electron beam lithography and very-narrow-linewidth long-cavity DBR laser diodes
4. Precise wavelength control for DFB laser diodes by novel corrugation delineation method
5. Minimization of phase errors in long fiber Bragg grating phase masks made using electron beam lithography
6. Fabrication of electron beam generated, chirped, phase mask (1070.11-1070.66 nm) for fiber Bragg grating dispersion compensator
7. Spatial frequency filtering using multiple-pass printing