Interaction forces between a glass surface and silica-modified PMMA-based abrasives for CMP measured by colloidal AFM

Electrochemical and Solid-State Letters

Volumn 10, Issue 2, 2007, Pages

  Armini, Silvia ^a,b   Burtovyy, Ruslan ^c   Luzinov, Igor ^c   Whelan, Caroline M ^b   Maex, Karen ^a   Moinpour, Mansour ^d  

^a UNIVERSITY OF LEUVEN   (Belgium)

^b IMEC   (Belgium)

^c AMRL   (United States)

^d INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; GLASS; INORGANIC COATINGS; PH EFFECTS; POLYMETHYL METHACRYLATES; TERPOLYMERS;

CHEMICAL MECHANICAL PLANARIZATION (CMP); ELECTROSTATIC ATTRACTIVE FORCES; GLASS ADHESION; REPULSIVE FORCES;

ABRASIVES;

EID: 33845953887     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2402982     Document Type: Article

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