A new computer method of image analysis applied to semiconductor's structural characterization

Physica B: Condensed Matter

Volumn 389, Issue 1, 2007, Pages 83-87

  Hernandez Fenollosa M A ^a   Cuesta Frau, D ^a   Damonte, L C ^a   Mico Tormos P ^a  

^a UNIVERSITAT POLITÈCNICA DE VALÈNCIA   (Spain)

Author keywords

Filtering; Image processing; SEM

Indexed keywords

COMPUTATIONAL METHODS; CRYSTAL STRUCTURE; ELECTRONIC PROPERTIES; GRAIN SIZE AND SHAPE; MORPHOLOGY; NANOSTRUCTURED MATERIALS; OPTICAL PROPERTIES; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR MATERIALS;

COMPUTER METHODS; DENDRITES; GREY LEVELS; STRUCTURAL CHARACTERIZATION;

IMAGE ANALYSIS;

EID: 33845733142     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physb.2006.07.029     Document Type: Article

References (55)

1. Burnside S.D., Shklover V., Barbé C., Comte P., Arendse F., Brooks K., and Grätzel M. Chem. Mater. 10 (1998) 2419
2. Sawunyama P., Yasumori A., and Okada K. Mater. Res. Bull. 33 (1998) 795
3. Deki S., and Aoi Y. J. Mater. Res. 13 (1998) 883
4. Pulker H.K. Thin Solid Films 34 (1976) 343
5. Meng L., and dos Santos M.P. Appl. Surf. Sci. 68 (1993) 319
6. Aradakani H.K. Thin Solid Films 248 (1994) 234
7. Lee W.G., Woo S.I., Kim J.C., Choi S.H., and Oh K.H. Thin Solid Films 237 (1994) 105
8. Kim E.K., Son M.H., Min S.K., Han Y.K., Wang C.H., and Yom S.S. J. Appl. Phys. 79 (1996) 4459
9. Aarik J., Aidla A., Sammelselg V., and Ukstare T. J. Cryst. Growth 181 (1997) 259
10. Yuan J., and Tsujikawa S. J. Electrochem. Soc. 142 (1995) 3444
11. Paranjape D.V., Sastry M., and Ganguly P. Appl. Phys. Lett. 63 (1993) 18
12. Hoffmann M.R., Martin S.T., Choi W., and Bahnemann D.W. Chem. Rev. 95 (1995) 69
13. Linsebrigler A.L., Lu G., and Yates J.T. Chem. Rev. 95 (1995) 735
14. Fujishima A., Rao T.N., and Tryk D.A. J. Photochem. Photobiol. C: Photochem. Rev. 1 (2000) 1
15. Ollis D.F., and Al-Ekabi H. Photocatalytic Purification and Treatment of Water and Air (1993), Elsevier, Amsterdam
16. Asahi R., Morikawa T., Ohwaki T., AoKi K., and Taga Y. Science 293 (2001) 269
17. Dutschke A., Diegelmann C., and Lobmann P.J. J. Mater. Chem. 13 (2003) 1058
18. Wang X.P., Yu Y., Hu X., and Gao L. Thin Solid Films 371 (2000) 148
19. Gutierrez-Tauste D., Zumeta I., Vigil E., Hernández-Fenollosa M.A., Doménech X., and Ayllón J.A. J. Photochem. Photobiol. A: Chem 175 (2005) 165
20. 2 films by the liquid phase deposition (LPD) process, in: Proceedings of the "20th European Photovoltaic Solar Energy Conference" 6-10 June 2005.
21. Ohta, Kawamura K., Orita M., Sarukura N., Hirano M., and Hosono H. Electron. Lett. 36 (2000) 984
22. See. Ahuja R., Farst L., Ericson O., Willis J.M., and Johannson B. J. Appl. Phys. 83 (1998) 8065
23. Pauporté Th., and Lincot D. Appl. Phys. Lett. 75 (1999) 3817
24. Dloczik L., and Kfnenkamp R. Nano Lett. 3 (2003) 651
25. Izaki M., Watase S., and Takahashi H. Adv. Mater. 15 (2003) 2000
26. Cembrero J., Elmanouni A., Hartiti B., Mollar M., and Mari B. Thin Solid Films 451 (2004) 198
27. Boyle D.S., Govender K., and O'Brien P. Chem. Commun. (2002) 80
28. Vayssieres L., Keis K., Lindquist S.-E., and Hagfeldt A. J. Phys. Chem. B 105 (2001) 3350
29. Choy J.-H., Jang E.-S., Won J.-H., Chung J.-H., Jang D.-J., and Kim Y.-W. Adv. Mater. 15 (2003) 1911
30. Yamabi S., and Imai H. J. Mater. Chem. 12 (2002) 3773
31. Peterson R.B., Fields C.L., and Gregg B.A. Langmuir 20 (2004) 5114
32. Huang M.H., Mao S., Feick H., Yan H., Wu Y., Kind H., Weber E., Russo R., and Yang P. Science 292 (2001) 1897
33. Huang M.H., Wu Y., Feick H., Tran N., Weber E., and Yang P. Adv. Mater. 13 (2001) 113
34. Park W.I., Kim D.H., Jung S.-W., and Yi G.-C. Appl. Phys. Lett. 80 (2002) 4232
35. Park W.I., Yi G.-C., Kim M., and Pennycook S.J. Adv. Mater. 14 (2002) 1841
36. Lyu S.C., Zhang Y., Lee C.J., Ruh H., and Lee H.J. Chem. Mater. 15 (2003) 3294
37. Wu J.-J., and Liu S.-C. Adv. Mater. 14 (2002) 215
38. Liu S.-C., and Wu J.-J. J. Mater. Chem. 12 (2002) 3125
39. Vigil E., Ayllón J.A., Peiró A.M., Rodríguez-Clemente R., Domènech X., and Peral J. Langmuir 17 (2001) 891
40. Vigil E., Saadoun L., Ayllón J.A., Domènech X., Zumeta I., and Rodríguez-Clemente R. Thin Solid Films 365 (2000) 12
41. Peiró A.M., Vigil E., Peral J., Domingo C., Domènech X., and Ayllón J.A. Thin Solid Films 411 (2002) 185
42. Peiró A.M., Domingo C., Peral J., Domènech X., Vigil E., Hernández-Fenollosa M.A., Mollar M., Mari B., and Ayllón J.A. Thin Solid Films 483 (2005) 79
43. Chen T., Ma K.K., and Chen L.H. IEEE Trans. Image Process. 8 12 (1999) 1834
44. Z. Yu, C. Bajaj, A fast and adaptive method for image contrast enhancement. in: IEEE International Conference on Image Processing, ICIP04, 2004.
45. Starck J.L., Murtagh F., Candès E.J., and Donoho D.L. IEEE Trans. Image Process. 12 6 (2003) 706
46. G. Ramponi, L. Tenze, S. Carrato, S. Marsi, Image processing: algorithms and systems II, in: Proceedings of SPIE/IS&T, vol. 5014, 2003, p. 169
47. H. Huttunen, O. Yli-Harja, in: International Symposium on Nonlinear Theory and its Applications, NOLTA, 1999, 65
48. Otsu N. IEEE Trans. Syst. Man Cybernet. 9 1 (1979) 62
49. Ablameyko S., and Pridmore T. Machine Interpretation of Line Drawing Images, Technical Drawings, Maps and Diagrams (2000), Springer, Berlin Heidelberg
50. Canny J. IEEE Trans. Pattern Anal. Mach. Intell. 1 11 (1986) 679
51. Ding L., and Goshtasby A. Pattern Recogn. 34 (2001) 721 Elsevier
52. Maher A., and Rabab W. IEEE Trans. Pattern Anal. Mach. Intell. 24 12 (2002) 1672
53. Wenyin L., and Dori D. IEEE Trans. Pattern Anal. Mach. Intell. 20 4 (1998) 424
54. Ablameyko S., et al. Journal of Vis. Commun. Image Represent. 5 3 (1994)
55. Zhang S.C., Liu Z.Q., and Robust A. Pattern Recogn. 38 (2005) 273 Elsevier