TiO2 thin film deposition from solution using microwave heating

Thin Solid Films

Volumn 365, Issue 1, 2000, Pages 12-18

  Vigil, Elena ^a   Saadoun, Lahcen ^b   Ayllón, José A ^c   Domènech, Xavier ^c   Zumeta, Inti ^a   Rodríguez Clemente, Rafael ^b  

^a Universidad de La   (Cuba)

^b INSTITUT DE CIÈNCIA DE MATERIALS DE BARCELONA ICMAB CSIC   (Spain)

^c UNIVERSITAT AUTÒNOMA DE BARCELONA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; FILM GROWTH; GLASS; MICROWAVE HEATING; SCANNING ELECTRON MICROSCOPY; SOLUTIONS; SUBSTRATES; THIN FILMS; TITANIUM DIOXIDE;

MICROWAVE REACTORS;

CONDUCTIVE FILMS;

EID: 0033879299     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(99)00946-3     Document Type: Article

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