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Volumn 9, Issue 9, 2000, Pages 1574-1581

Modification of emission properties of diamond films due to surface treatment process

Author keywords

[No Author keywords available]

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CHROMIUM; CURRENT DENSITY; ELECTRON EMISSION; GRAIN SIZE AND SHAPE; MORPHOLOGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA ETCHING; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICA; SURFACE TREATMENT;

EID: 0034274820     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(00)00312-5     Document Type: Article
Times cited : (13)

References (24)
  • 19
    • 85120130487 scopus 로고    scopus 로고
    • Y.H. Chen, C.T. Hu and I.N. Lin., J. Appl. Phys. (1998) (submitted).
  • 20
    • 85120114558 scopus 로고
    • A. Vander Ziel Solid State Physical Electronics 1968 Prentice-Hall Englewood Cliffs, NJ 144
    • (1968) , pp. 144
    • Vander Ziel, A.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.