Optimization of processing condition for deposition of DLC using FIB-CVD method

JSME International Journal, Series C: Mechanical Systems, Machine Elements and Manufacturing

Volumn 49, Issue 2, 2006, Pages 361-369

  Sakamoto, Naomichi ^a   Kogo, Yasuo ^b   Yagi, Takahiro ^b   Yasuno, Takuya ^a   Taniguchi, Jun ^b   Miyamoto, Iwao ^b  

^a IWAKI MEISEI UNIVERSITY   (Japan)

^b TOKYO UNIVERSITY OF SCIENCE   (Japan)

Author keywords

Chemical vapor deposition; Diamond like carbon; Focused ion beam; High resolution transmission electron microscopy; Processing condition; Vickers hardness; Young's modulus

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELASTIC MODULI; HARDNESS; ION BEAM ASSISTED DEPOSITION; MICROSTRUCTURE; TRANSMISSION ELECTRON MICROSCOPY;

FOCUSED ION-BEAM; HIGH-RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; OPTIMUM DEPOSITION; VICKERS HARDNESS;

DIAMOND LIKE CARBON FILMS;

CHEMICAL VAPOR DEPOSITION; DIAMOND LIKE CARBON FILMS; ELASTIC MODULI; HARDNESS; ION BEAM ASSISTED DEPOSITION; MICROSTRUCTURE; TRANSMISSION ELECTRON MICROSCOPY;

EID: 33845636638     PISSN: 13447653     EISSN: 1347538X     Source Type: Journal    
DOI: 10.1299/jsmec.49.361     Document Type: Article

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