Chemical and phase compositionof SnOx:F films grown by DC reactive sputtering

Surface and Coatings Technology

Volumn 148, Issue 2-3, 2001, Pages 103-109

  Martel, A ^a,b   Caballero Briones, F ^a   Bartolo Perez P ^c   Iribarren, A ^a,b   Castro Rodriguez R ^c   Zapata Navarro, A ^a   Pea, J L ^a,c  

^a INSTITUTO POLITÉCNICO NACIONAL   (Mexico)

^b UNIVERSITY OF HAVANA   (Cuba)

^c DEPARTAMENTO DE FÍSICA APLICADA   (Mexico)

Author keywords

B Phase transitions; B Photoelectronspectroscopy; B X Ray diffraction; C Reactive sputtering; D Tin oxide

Indexed keywords

CATHODES; COMPOSITION; FILM GROWTH; PHASE COMPOSITION; SPUTTER DEPOSITION; STOICHIOMETRY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

MOLAR FRACTIONS; X-RAY DIFFRACTOGRAMS;

METALLIC FILMS;

FILM;

EID: 0035803963     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01351-2     Document Type: Article

References (15)

1. Thin films for photovoltaic and related device applications