Self-diffusion constants in silicon: Ab initio calculations in combination with classical rate theory

Journal of Chemical Physics

Volumn 125, Issue 22, 2006, Pages

  Hwang, Chi Ok ^a,b  

^a Soongsil University   (South Korea)

^b National Institute for Mathematical Sciences   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; COMPUTER SIMULATION; DIFFUSION; MONTE CARLO METHODS; SEMICONDUCTOR DEVICES; SILICON;

DYNAMICAL MATRIX METHOD; KINETIC MONTE CARLO (KMC) SIMULATIONS; POISSON PROCESS; SELF DIFFUSION;

MOLECULAR DYNAMICS;

EID: 33845515103     PISSN: 00219606     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2400224     Document Type: Article

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