Excimer laser crystallization of amorphous silicon on molybdenum coated glass substrates

Journal of Applied Physics

Volumn 91, Issue 5, 2002, Pages 2969-2973

  Brendel, K ^a   Lengsfeld, P ^a   Sieber, I ^a   Schopke A ^a   Nickel, N H ^a   Fuhs, W ^a   Nerding, M ^b   Strunk, H P ^b  

^a HAHN MEITNER INSTITUT   (Germany)

^b UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 33845419071     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1448678     Document Type: Article

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