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Journal of the Electrochemical Society

Volumn 154, Issue 1, 2007, Pages

The effect of LPCVD silicon nitride deposition on the Si- SiO2 interface of oxidized silicon wafers

(2) Jin, H a Weber, K J a

a AUSTRALIAN NATIONAL UNIVERSITY (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; INTERFACES (MATERIALS); PRESSURE EFFECTS; SILANES; SILICON WAFERS;

DICHLOROSILANE; INTERFACE DEFECTS; NITRIDE DEPOSITION; SILICON SURFACE;

SILICON NITRIDE;

EID: 33845245838 PISSN: 00134651 EISSN: None Source Type: Journal
DOI: 10.1149/1.2382455 Document Type: Article

Times cited : (7)

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