A model for copper deposition in the damascene process

Journal of the Electrochemical Society

Volumn 154, Issue 1, 2007, Pages

  Gabrielli, C ^a,d   Mootguy P ^a   Perrot, H ^a,d   Zdunek, A ^b,d   Sanz, D Nieto ^c  

^a SORBONNE UNIVERSITÉ   (France)

^b Chicago Research Center Inc   (United States)

^c AIR LIQUIDE   (France)

^d ELECTROCHEMICAL SOCIETY   (France)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER ACCELERATOR COMPLEX; COPPER DEPOSITION; DAMASCENE PROCESS; SURFACE COVERAGE;

ADSORPTION; AGING OF MATERIALS; DEPOSITION; SPECTROSCOPIC ANALYSIS; SURFACE REACTIONS;

COPPER;

EID: 33845237117     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2364831     Document Type: Article

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