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Journal of Applied Physics

Volumn 100, Issue 10, 2006, Pages

Study on interfacial strain behavior of functional oxide heterostructures

(4) Zhu, J a Wei, X H a Zhang, Y a Li, Y R a

a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA (China)

Author keywords

[No Author keywords available]

Indexed keywords

BARIUM COMPOUNDS; FILM GROWTH; HIGH ENERGY ELECTRON DIFFRACTION; SINGLE CRYSTALS; STRAIN MEASUREMENT; SURFACE TENSION; THIN FILMS;

EPITAXIAL OXIDE FILMS; LATTICE RELAXATION; OXIDE FILMS; STRAIN RELAXATION;

HETEROJUNCTIONS;

EID: 33845224290 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.2375014 Document Type: Article

Times cited : (27)

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