Dry etching of (Ba,Sr)TiO3 thin films using an inductively coupled plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 4, 2005, Pages 894-897

  Kim, Gwan Ha ^a   Kim, Kyoung Tae ^a   Kim, Chang Ii ^a  

^a Chung Ang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

BARIUM COMPOUNDS; DRY ETCHING; EMISSION SPECTROSCOPY; INDUCTIVELY COUPLED PLASMA; SPUTTERING;

OPTICAL EMISSION SPECTROSCOPY (OES); PHYSICAL ETCH; PHYSICAL SPUTTERING;

THIN FILMS;

EID: 31044446452     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1914814     Document Type: Conference Paper

References (13)

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