Correlation between dielectric properties and strain in Pb0.5 Sr0.5TiO3 thin films prepared by using the sol-gel method

Surface and Coatings Technology

Volumn 190, Issue 2-3, 2005, Pages 190-194

  Kim, Kyoung Tae ^a   Kim, Chang Il ^a   Lee, Sung Gap ^b   Kim, Hwa Mok ^c  

^a Chung Ang University   (South Korea)

^b Seonam University   (South Korea)

^c Dongguk University   (South Korea)

Author keywords

(Pb,Sr)TiO3 (PST); Deposition process; Dielectric properties; Sol gel

Indexed keywords

ANNEALING; DIELECTRIC LOSSES; DIELECTRIC MATERIALS; PEROVSKITE; SOL-GELS; THIN FILMS;

ANNEALING TEMPERATURE; INTERNAL STRAIN;

LEAD COMPOUNDS;

SOL-GEL PROCESS;

EID: 10144264596     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.03.023     Document Type: Article

References (26)

1. Kuroiwa T. Tsunemine Y. Horikawa T. Makita T. Tanimura J. Mikami N. Sato K. Jpn. J. Appl. Phys. 33 1994-5187
2. Li A. Ge C. Wu D. Lü P. Xiong S. Ming N. Mater. Lett. 31 1997 15
3. Mueller C.H. Treece R.E. Rivkin T.V. Miranda F.A. Moutinho H.R. Swartzlander-Franz A. Dalberth M. Rogers C.T. IEEE Trans. Appl. Supercond. 7 1997 3512
4. Kawahara T. Yamamuka M. Yuuki A. Ono K. Jpn. J. Appl. Phys. 35 1996 4880
5. Kingon A.I. Streiffer S.K. Basceri C. Summerfelt S.R. MRS Bull. 21 1996 46
6. Dibenedetto B. Cronan C.J. J. Am. Ceram. Soc. 51 1968 364
7. Chung H.J. Woo S.I. J. Vac. Sci. Technol. B19 2001 275
8. Tay S.T. Jiang X.H. Huan C.H.A. Wee A.T.S. Liu R. J. Appl. Phys. 88 2000 5928
9. Boyle T.J. Buchheit C.D. Rodriguez M.A. J. Mater. Res. 11 1996 2274
10. Chen S.Y. Lee V.C. J. Appl. Phys. 87 2000 3050
11. Ishikawa K. Funakubo H. Appl. Phys. Lett. 75 1999 1970
12. Tahan D.M. Safari A. Klein L.C. J. Am. Ceram. Soc. 79 1996 1953
13. Warren B.E. X-ray Diffraction 1990 257 Dover New York
14. Scherrer P. Gottinger Nachrichten 2 1918 98
15. Kim T. Oh J. Park B. Hong K.S. Appl. Phys. Lett. 76 2000 3043
16. Knauss L.A. Pond J.M. Horwitz J.S. Chrisey D.B. Mueller C.H. Treece R. Appl. Phys. Lett. 69 1996 5
17. Wu Y. Jacobs E.G. Pinizzotto R.F. Tsu R. Liu H.Y. Summerfelt S.R. Gnade B.E. In: Tuttle B.A. Desu S.B. Ramesh R. Shiosaki T. (Eds.). Ferroelectric Thin Films, Materials Research Society Symposium Proceeding, Boston, USA, vol. 361 1994 269
18. Shaw T.M. Suo Z. Huang M. Liniger E. Laibowitz R.B. Baniecki J.D. Appl. Phys. Lett. 75 1999 2129
19. Chang W. Horwitz J.S. Carter A.C. Pond J.M. Kirchoefer S.W. Gilmore C.M. Chrisey D.B. Appl. Phys. Lett. 74 1999 1033
20. Ramesh R. Thin Film Ferroeletric Material and Device 1997 9 Kluwer Academic Netherlands
21. Parker L.H. Tasch A.F. IEEE Circuits Devices Mag. 6 1990 17
22. Horwitz J.S. Chang W. Carter A.C. Pond J.M. Kirchoefer S.W. Chrisey D.B. Levy J. Hubert C. Integr. Ferroelectr. 22 1998 279
23. Awan S.A. Gould R.D. Gravano S. Thin Solid Films 355 1999 456
24. Joshi P.C. Krupanidhi S.B. J. Appl. Phys. 73 1993 7627
25. Rakhshani A.E. J. Appl. Phys. 69 1991 2365
26. Simmons J.G. In: Maissel L.I. Glang R. (eds.). Handbook of Thin Film Technology 1970 14 McGraw-Hill New York