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Volumn 253, Issue 1-2, 2006, Pages 210-213

Evolution of radiation-induced carbon-oxygen-related defects in silicon upon annealing: LVM studies

Author keywords

Carbon; Irradiation; Oxygen; Silicon; Vibrational modes

Indexed keywords

ANNEALING; BAND STRUCTURE; RADIATION DAMAGE; SEMICONDUCTING SILICON; SPECTROSCOPIC ANALYSIS; THERMAL EFFECTS;

EID: 33751307984     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2006.10.029     Document Type: Article
Times cited : (33)

References (16)
  • 1
    • 0001548018 scopus 로고
    • Moss T.S. (Ed), Elsevier Science, Amsterdam
    • Davies G., and Newman R.C. In: Moss T.S. (Ed). Handbook on Semiconductors Vol. 3b (1994), Elsevier Science, Amsterdam 1557
    • (1994) Handbook on Semiconductors , vol.3 b , pp. 1557
    • Davies, G.1    Newman, R.C.2
  • 2
    • 0003371040 scopus 로고
    • Shimura F. (Ed), Academic, London
    • In: Shimura F. (Ed). Oxygen in Silicon. Semiconductors and Semimetals Vol. 42 (1994), Academic, London 679
    • (1994) Semiconductors and Semimetals , vol.42 , pp. 679


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.