Microstructure and properties of multilayer coatings with covalent bonded hard materials

Surface and Coatings Technology

Volumn 116-119, Issue , 1999, Pages 313-320

  Leiste, H ^a   Dambacher, U ^a   Ulrich, S ^a   Holleck, H ^a  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

Covalent bonded material; Multilayer; Thin films; Wear resistant

Indexed keywords

AMORPHOUS FILMS; MAGNETRON SPUTTERING; METALLIC FILMS; MICROHARDNESS; MICROSTRUCTURE; SILICON CARBIDE; SILICON NITRIDE; SPUTTER DEPOSITION; STOICHIOMETRY; THIN FILMS; WEAR RESISTANCE;

MULTILAYER COATINGS;

MULTILAYERS;

EID: 0033312719     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(99)00190-5     Document Type: Article

References (23)

1. Wahab Q., Hultman L., Sundgren J.-E., Willander M. Mater. Sci. .Eng. B. 11:1992;61.
2. Wahab Q., Glass R.C., Ivanov I.P., Birch J., Sundgren J.-E., Willander M. J. Appl. Phys. 74:(3):1993;1663.
3. Wahab Q., Hultman L., Ivanov I.P., Willander M., Sundgren J.-E. Thin Solid Films. 261:1995;317.
4. Ulrich S., Theel T., Schwan J., Batori V., Scheib M., Ehrhard H. Diamond Relat. Mater. 6:1997;645.
5. Zaytouni M., Riviere J.P., Denanot M.F., Allain J. Thin Solid Films. 287:1996;1.
6. Knotek O., Löffler F., Wolkers L. Diamond Relat. Mater. 2:1993;528.
7. Grill A., Aron P.R. Thin Solid Films. 96:1982;25.
8. McCormick C.S., Weber C.E., Abelson J.R., Davis G.A., Weiss R.E., Aebi V. J. Vac. Sci. Technol. A. 15:(5):1997;2770.
9. Ghosh S.K., et al. Thin Solid Films. 166:1988;359.
10. Holleck H. Surf. .Coat. Technol. 43/44:1990;245.
11. Holleck H., Schier V. Surf. Coat. Technol. 76/77:1995;328.
12. Chu X., Barnett S.A. J. Appl. Phys. 77:(9):1995;4403.
13. Holleck H., Schulz H. Surf. Coat. Technol. 36:1988;707.
14. Holleck H., Lahres M., Woll P. Surf. Coat. Technol. 41:1990;179.
15. Hilz G., Holleck H. Mater. Sci. Eng. A. 139:1991;268.
16. Mirkarimi P.B., Barnett S.A., Hubbard K.M., Jervis T.R., Hultman L. J. Mater. Res. 9:1994;1456.
17. Madan A., Yashar P., Shinn M., Barnett S.A. Thin Solid Films. 302:1997;147.
18. Jensen H., Sobota J., Sorensen G. J. Vac. Sci. Technol. A. 15:(3):1997;941.
19. Knotek O., Löffler F., Wolkers L. Diamond Relat. Mater. 2:1993;528.
20. Tsou H.T., Kowbel W. Carbon. 33:(9):1995;1279-1288.
21. Madan A., Kim I.W., Cheng S.C., Yashar P., Dravid V.P., Barnett S.A. Phys. Rev. Lett. 78:(9):1997;1743.
22. Wu M.-L., Lin X.-W., Dravid V.P., Chung Y.-W., Wong M.-S., Sproul W.D. J. Vac. Sci. Technol. A. 15:(3):1997;946.
23. Li D., Chu X., Cheng S.-C., Lin X.-W., Dravid V.P., Chung Y.-W., Wong M.-S., Sproul W.D. J. Appl. Phys. Lett. 67:(2):1995;203.