Reactive ion etching and ion beam etching for ferroelectric memories

Integrated Ferroelectrics

Volumn 61, Issue , 2004, Pages 213-220

  Shao, Tian Qi ^a   Ren, Tian Ling ^a   Liu, Li Tian ^a   Zhu, Jun ^a   Li, Zhi Jian ^a  

^a TSINGHUA UNIVERSITY   (China)

Author keywords

Ferroelectric thin film; Ion beam etching (IBE); PZP; Reactive ion etching (RIE); Sol gel

Indexed keywords

DEPOSITION; ELECTRODES; FERROELECTRIC THIN FILMS; ION BEAMS; REACTIVE ION ETCHING;

ION BEAM ETCHING (IBE); PROCESS-INDUCED DAMAGES; PZP;

DATA STORAGE EQUIPMENT;

EID: 33751170235     PISSN: 10584587     EISSN: 16078489     Source Type: Conference Proceeding    
DOI: 10.1080/10584580490459288     Document Type: Article

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